Publications

Author(s) Title Year Journal/Proceedings Publication Type URL
Bahlmann N., Chandrasekhara V., Erdmann A., Hertel P. and Gerhardt R., Lehmann R., Salz D., Schröteler F., Wallenhorst M., and Dötsch H. Improved design of magneto-optic rib waveguides for optical isolators 1998 Journal of Lightwave Technology Journal Article  
BibTeX
@ARTICLE{BCE98,
  author = {N. Bahlmann and V. Chandrasekhara and A. Erdmann and R. Gerhardt
	and P. Hertel and R. Lehmann and D. Salz and F. Schröteler and M.
	Wallenhorst and H. Dötsch},
  title = {Improved design of magneto-optic rib waveguides for optical isolators},
  journal = {Journal of Lightwave Technology},
  year = {1998},
  volume = {16},
  pages = {818},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Bisschop De P., Erdmann A., and Rathsfeld A. Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography 2005 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{BER05,
  author = {P. De Bisschop and A. Erdmann and A. Rathsfeld},
  title = {Simulation of the effect of a resist-surface bound air bubble on
	imaging in immersion lithography},
  journal = {Proc. SPIE},
  year = {2005},
  volume = {5754},
  pages = {243},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Burger S., Zschiedrich L., Schmidt F., and Erdmann A. and Evanschitzky P. Benchmark of rigorous methods for electromagnetic field simulations 2008 Proc. SPIE 7122 Journal Article  
BibTeX
@ARTICLE{BZS08,
  author = {S. Burger and L. Zschiedrich and F. Schmidt and P. Evanschitzky and
	A. Erdmann},
  title = {Benchmark of rigorous methods for electromagnetic field simulations},
  journal = {Proc. SPIE 7122},
  year = {2008},
  volume = {7122},
  pages = {71221S},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Handbook of Photomask Manufacturing Technology 2005   Book Chapter  
BibTeX
@INBOOK{Erd05a,
  chapter = {Modeling and simulation},
  title = {Handbook of Photomask Manufacturing Technology},
  publisher = {Taylor \& Francis},
  year = {2005},
  editor = {S. Rizvi},
  author = {A. Erdmann},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A. Optische Lithographie in der Halbleiterherstellung: Grundlagen, Techniken zu Verbesserung der Auflösung und ausgewählte aktuelle Problemstellungen     Misc  
BibTeX
@UNPUBLISHED{Erd08,
  author = {A. Erdmann},
  title = {Optische Lithographie in der Halbleiterherstellung: Grundlagen, Techniken
	zu Verbesserung der Auflösung und ausgewählte aktuelle Problemstellungen},
  note = {Vortrag Uni Jena 17.7.2008 bzw. Max-Plank Einrichtung Erlangen 7.10.2008},
  owner = {aerdmann},
  timestamp = {2008.07.15}
}
Erdmann A. Pushing optical lithography deeper into the sub-wavelength range: double patterning & double exposure     Misc  
BibTeX
@UNPUBLISHED{Erd08a,
  author = {A. Erdmann},
  title = {Pushing optical lithography deeper into the sub-wavelength range:
	double patterning \& double exposure},
  note = {Vortrag im IISB Kolloquium, Juni 2008},
  owner = {aerdmann},
  timestamp = {2008.07.15}
}
Erdmann A. Selected advanced topics in lithography simulation     Misc  
BibTeX
@UNPUBLISHED{Erd08b,
  author = {A. Erdmann},
  title = {Selected advanced topics in lithography simulation},
  note = {Vortrag bei Toshiba, Yokohama, April 2008},
  owner = {aerdmann},
  timestamp = {2008.07.15}
}
Erdmann A. Mask topography effects: modeling techniques and impact on lithographic processes     Misc  
BibTeX
@UNPUBLISHED{Erd08c,
  author = {A. Erdmann},
  title = {Mask topography effects: modeling techniques and impact on lithographic
	processes},
  note = {Vortrag bei Samsung, Seoul, Januar 2008},
  owner = {aerdmann},
  timestamp = {2008.07.15}
}
Erdmann A. Optical lithography for semiconductor fabrication: Basics, resolution enhancement techniques, and selected actual problems     Misc  
BibTeX
@UNPUBLISHED{Erd08d,
  author = {A. Erdmann},
  title = {Optical lithography for semiconductor fabrication: Basics, resolution
	enhancement techniques, and selected actual problems},
  note = {Talk Max-Plank Einrichtung Erlangen 7.10.2008},
  owner = {aerdmann},
  timestamp = {2008.09.30}
}
Erdmann A. Evaluation of mask materials and geometries by lithography simulation 2007 IMS-Workshop "Masks and More" \bf Invited Talk Misc  
BibTeX
@CONFERENCE{Erd07,
  author = {A. Erdmann},
  title = {Evaluation of mask materials and geometries by lithography simulation},
  booktitle = {IMS-Workshop "Masks and More" {\bf Invited Talk}},
  year = {2007},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects \bf Best Paper Award 2005 21th European Mask and Lithography Conference (EMLC), Dresden (Germany) Misc  
BibTeX
@CONFERENCE{Erd05,
  author = {A. Erdmann},
  title = {Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization
	effects {\bf Best Paper Award}},
  booktitle = {21th European Mask and Lithography Conference (EMLC), Dresden (Germany)},
  year = {2005},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A. Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects \bf Invited Talk 2005 Photomask Japan, Yokohama (Japan) Misc  
BibTeX
@CONFERENCE{Erd05b,
  author = {A. Erdmann},
  title = {Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization
	effects {\bf Invited Talk}},
  booktitle = {Photomask Japan, Yokohama (Japan)},
  year = {2005},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Semiconductor lithography simulation 2004 Laser Focus World Journal Article  
BibTeX
@ARTICLE{Erd04,
  author = {A. Erdmann},
  title = {Semiconductor lithography simulation},
  journal = {Laser Focus World},
  year = {2004},
  volume = {March},
  pages = {61},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Process optimisation using lithography simulation \bf Invited Talk 2003 ICMNE, Mocow (Russia) Misc  
BibTeX
@CONFERENCE{Erd03,
  author = {A. Erdmann},
  title = {Process optimisation using lithography simulation {\bf Invited Talk}},
  booktitle = {ICMNE, Mocow (Russia)},
  year = {2003},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Topography effects and wave aberrations in advanced PSM-technology 2001 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{Erd01,
  author = {A. Erdmann},
  title = {Topography effects and wave aberrations in advanced PSM-technology},
  journal = {Proc. SPIE},
  year = {2001},
  volume = {4346},
  pages = {345},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A. When do we need a rigorous simulation of light diffraction from a photolithographic mask ? 1999 Topical meeting of the Optical Society of America (OSA), Santa Clara (USA) Misc  
BibTeX
@CONFERENCE{Erd99,
  author = {A. Erdmann},
  title = {When do we need a rigorous simulation of light diffraction from a
	photolithographic mask ?},
  booktitle = {Topical meeting of the Optical Society of America (OSA), Santa Clara
	(USA)},
  year = {1999},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Modifications of the resolution limits of the photolithographic process due to nonlinear optical propagation effects in the resist layers 1996 17th Congress of the International Comission for Optics: Optics for Science and New Technology, Taejon (Korea) Misc  
BibTeX
@CONFERENCE{Erd96,
  author = {A. Erdmann},
  title = {Modifications of the resolution limits of the photolithographic process
	due to nonlinear optical propagation effects in the resist layers},
  booktitle = {17th Congress of the International Comission for Optics: Optics for
	Science and New Technology, Taejon (Korea)},
  year = {1996},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A. Modeling the photolithographic process with light induced modifications of the refractive index during exposure 1996 Sematech DUV Workshop, Austin (USA) Misc  
BibTeX
@CONFERENCE{Erd96a,
  author = {A. Erdmann},
  title = {Modeling the photolithographic process with light induced modifications
	of the refractive index during exposure},
  booktitle = {Sematech DUV Workshop, Austin (USA)},
  year = {1996},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., and Arnz M. The impact of aberration averaging during step-and-scan on the photolithographic process 1998 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{ErA98,
  author = {A. Erdmann and M. Arnz},
  title = {The impact of aberration averaging during step-and-scan on the photolithographic
	process},
  journal = {Microelectronic Engineering},
  year = {1998},
  volume = {41-42},
  pages = {117},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., Arnz M., Maenhoudt M., Baselmans J., and Osnabruegge van J.C. Lithographic process simulation for scanners 1998 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EAM98,
  author = {A. Erdmann and M. Arnz and M. Maenhoudt and J. Baselmans and J.C.
	van Osnabruegge},
  title = {Lithographic process simulation for scanners},
  journal = {Proc. SPIE},
  year = {1998},
  volume = {3334},
  pages = {164},
  owner = {aerdmann},
  timestamp = {2008.09.10}
}
Erdmann A., Citarella G., Evanschitzky P., Philipsen V. and Schermer H., and Bisschop De P. Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask 2006 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{ECE06,
  author = {A. Erdmann and G. Citarella and P. Evanschitzky and H. Schermer and
	V. Philipsen and P. De Bisschop},
  title = {Validity of the Hopkins approximation in simulations of hyper-NA
	(NA>1) line-space structures for an attenuated PSM mask},
  journal = {Proc. SPIE},
  year = {2006},
  volume = {6154},
  pages = {167},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., and Evanschitzky P. Rigorous electromagnetic field mask modeling and related lithographic effects in the low k1 and ultrahigh NA regime 2007 Journal of Micro/Nanolithography, MEMS, and MOEMS, selected for the September 17, 2007 issue of Virtual Journal of Nanoscale Science & Technology Journal Article  
BibTeX
@ARTICLE{ErE07,
  author = {A. Erdmann and P. Evanschitzky},
  title = {Rigorous electromagnetic field mask modeling and related lithographic
	effects in the low k1 and ultrahigh NA regime},
  journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS, selected for the
	September 17, 2007 issue of Virtual Journal of Nanoscale Science
	\& Technology},
  year = {2007},
  volume = {6},
  pages = {031002},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., and Evanschitzky P. Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects \bf Invited Talk 2005 BACUS Conference, Monterey (USA) Misc  
BibTeX
@CONFERENCE{ErE05,
  author = {A. Erdmann and P. Evanschitzky},
  title = {Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization
	effects {\bf Invited Talk}},
  booktitle = {BACUS Conference, Monterey (USA)},
  year = {2005},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., and Evanschitzky P. Exploring potentials and limits of EUV-lithography by simulation \bf nvited Talk 2004 326. WE-Heraeus Seminar on XUV-Technologies and Applications, Bad Honnef (Germany) Misc  
BibTeX
@CONFERENCE{ErE04,
  author = {A. Erdmann and P. Evanschitzky},
  title = {Exploring potentials and limits of EUV-lithography by simulation
	{\bf nvited Talk}},
  booktitle = {326. WE-Heraeus Seminar on XUV-Technologies and Applications, Bad
	Honnef (Germany)},
  year = {2004},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Evanschitzky P., and Bisschop De P. Mask anf wafer topography effects in immersion lithography 2005 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EEB05,
  author = {A. Erdmann and P. Evanschitzky and P. De Bisschop},
  title = {Mask anf wafer topography effects in immersion lithography},
  journal = {Proc. SPIE},
  year = {2005},
  volume = {5754},
  pages = {383},
  owner = {aerdmann},
  timestamp = {2008.09.12}
}
Erdmann A., Evanschitzky P., Citarella G., and Bisschop De P. and Fühner T. Rigorous mask modeling using waveguide and FDTD methods: An assessment for typical hyper NA imaging problems 2006 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EEC06,
  author = {A. Erdmann and P. Evanschitzky and G. Citarella and T. Fühner and
	P. De Bisschop},
  title = {Rigorous mask modeling using waveguide and FDTD methods: An assessment
	for typical hyper NA imaging problems},
  journal = {Proc. SPIE},
  year = {2006},
  volume = {6283},
  pages = {628319},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., Evanschitzky P., Fuehner T., and Schnattinger T. and Meliorisz B. Lithography simulation: modeling techniques and selected applications \bf Invited Talk 2008 SEMICON Korea Misc  
BibTeX
@CONFERENCE{EET08b,
  author = {A. Erdmann and P. Evanschitzky and T. Fuehner and B. Meliorisz and
	T. Schnattinger},
  title = {Lithography simulation: modeling techniques and selected applications
	{\bf Invited Talk}},
  booktitle = {SEMICON Korea},
  year = {2008},
  owner = {aerdmann},
  timestamp = {2008.07.15}
}
Erdmann A., Evanschitzky P., Fuehner T., and Schnattinger Thomas Lithography Simulation \bf Invited Talk 2008 4. Dornbirner Mikrotechniktage Misc  
BibTeX
@CONFERENCE{EEF08a,
  author = {A. Erdmann and P. Evanschitzky and T. Fuehner and Thomas Schnattinger},
  title = {Lithography Simulation {\bf Invited Talk}},
  booktitle = {4. Dornbirner Mikrotechniktage},
  year = {2008},
  owner = {aerdmann},
  timestamp = {2008.07.15}
}
Erdmann A., Evanschitzky P., and Fühner T. Simulation and evaluation of contact hole imaging for high numerical aperture semiconductor lithography 2007 3th EOS Topical Meeting on Advanced Imaging Techniques, Lille (France) Misc  
BibTeX
@CONFERENCE{EEF07,
  author = {A. Erdmann and P. Evanschitzky and T. Fühner},
  title = {Simulation and evaluation of contact hole imaging for high numerical
	aperture semiconductor lithography},
  booktitle = {3th EOS Topical Meeting on Advanced Imaging Techniques, Lille (France)},
  year = {2007},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Evanschitzky P., Fühner T., Matiut D., Schnattinger T., and Tollkühn B. Simulation of optical resolution enhancement techniques for semiconductor microlithography \bf Invited Talk 2004 ICO, Tokyo (Japan) Misc  
BibTeX
@CONFERENCE{EEF04,
  author = {A. Erdmann and P. Evanschitzky and T. Fühner and D. Matiut and T.
	Schnattinger and B. Tollkühn},
  title = {Simulation of optical resolution enhancement techniques for semiconductor
	microlithography {\bf Invited Talk}},
  booktitle = {ICO, Tokyo (Japan)},
  year = {2004},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Evanschitzky P., Fühner T., and Schnattinger T. Lithography simulation \bf Invited Talk 2007 SEMICON Europe, Stuttgart (Germany) Misc  
BibTeX
@CONFERENCE{EEF07a,
  author = {A. Erdmann and P. Evanschitzky and T. Fühner and T. Schnattinger},
  title = {Lithography simulation {\bf Invited Talk}},
  booktitle = {SEMICON Europe, Stuttgart (Germany)},
  year = {2007},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Evanschitzky P., Fühner T., Xu C.B. and Schnattinger T., and Szmanda C. Rigorous electromagnetic field simulation of two-beam Interference exposures for the exploration of double patterning and double exposure scenarios 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EEF08,
  author = {A. Erdmann and P. Evanschitzky and T. Fühner and T. Schnattinger
	and C.B. Xu and C. Szmanda},
  title = {Rigorous electromagnetic field simulation of two-beam Interference
	exposures for the exploration of double patterning and double exposure
	scenarios},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {6924},
  pages = {692452},
  owner = {aerdmann},
  timestamp = {2008.05.08}
}
Erdmann A., Farkas R., Fühner T., Tollkühn B., and Kókai G. Mask and source optimization for lithographic imaging systems 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EFF03,
  author = {A. Erdmann and R. Farkas and T. Fühner and B. Tollkühn and G. Kókai},
  title = {Mask and source optimization for lithographic imaging systems},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5182},
  pages = {88},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., and Friedrich C. Rigorous diffraction analysis for future mask technology 2000 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{ErF00,
  author = {A. Erdmann and C. Friedrich},
  title = {Rigorous diffraction analysis for future mask technology},
  journal = {Proc. SPIE},
  year = {2000},
  volume = {4000},
  pages = {684},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., Fuehner T., and Evanschitzky P. Optimization of mask absorber stacks and illumination settings for contact hole imaging 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EFE08,
  author = {A. Erdmann and T. Fuehner and P. Evanschitzky},
  title = {Optimization of mask absorber stacks and illumination settings for
	contact hole imaging},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {7028},
  pages = {in print},
  owner = {aerdmann},
  timestamp = {2008.08.20}
}
Erdmann A., Fühner T., Schnattinger T., and Tollkühn B. Towards automatic mask and source optimization for optical lithography 2004 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EFS04,
  author = {A. Erdmann and T. Fühner and T. Schnattinger and B. Tollkühn},
  title = {Towards automatic mask and source optimization for optical lithography},
  journal = {Proc. SPIE},
  year = {2004},
  volume = {646},
  pages = {5377},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Fühner T., Seifert S., Popp S, and Evanschitzky P. The impact of the mask stack and its optical parameters on the imaging performance 2007 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EFS2007,
  author = {A. Erdmann and T. Fühner and S. Seifert and S Popp and P. Evanschitzky},
  title = {The impact of the mask stack and its optical parameters on the imaging
	performance},
  journal = {Proc. SPIE},
  year = {2007},
  volume = {6520},
  pages = {65201I-1},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Erdmann A., Gordon R., McCallum M., and Rosenbusch Anja 3D electromagnetic field simulation for low-k1 lithography applications 2001 Microlithography World Journal Article  
BibTeX
@ARTICLE{EGM01,
  author = {A. Erdmann and R. Gordon and M. McCallum and Anja Rosenbusch},
  title = {3D electromagnetic field simulation for low-k1 lithography applications},
  journal = {Microlithography World},
  year = {2001},
  volume = {February},
  pages = {5},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Graf T., Bubke K., Hoellein I., and Teuber S. Mask defect printing mechanisms for future lithography generations 2006 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EGB06,
  author = {A. Erdmann and T. Graf and K. Bubke and I. Hoellein and S. Teuber},
  title = {Mask defect printing mechanisms for future lithography generations},
  journal = {Proc. SPIE},
  year = {2006},
  volume = {6154},
  pages = {464},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., Henderson C.L., and Willson C.G. The impact of exposure induced refractive index changes of photoresists on the photolithographic process 2001 Journal of Applied Physics Journal Article  
BibTeX
@ARTICLE{EHW01,
  author = {A. Erdmann and C.L. Henderson and C.G. Willson},
  title = {The impact of exposure induced refractive index changes of photoresists
	on the photolithographic process},
  journal = {Journal of Applied Physics},
  year = {2001},
  volume = {89},
  pages = {8163},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., Henderson C.L., Willson C.G., and Dammel R.R. Some aspects of thick film resist performance and modeling 1998 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EHW98,
  author = {A. Erdmann and C.L. Henderson and C.G. Willson and R.R. Dammel},
  title = {Some aspects of thick film resist performance and modeling},
  journal = {Proc. SPIE},
  year = {1998},
  volume = {3333},
  pages = {1201},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Henderson C.L., Willson C.Grant, and Henke W. Influence of optical nonlinearities of photoresists on the photolithographic process: Applications 1997 Proc. SPIE 3048 Journal Article  
BibTeX
@ARTICLE{EHW97a,
  author = {A. Erdmann and C.L. Henderson and C.Grant Willson and W. Henke},
  title = {Influence of optical nonlinearities of photoresists on the photolithographic
	process: Applications},
  journal = {Proc. SPIE 3048},
  year = {1997},
  volume = {3048},
  pages = {114},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Henderson C.L., Willson C.Grant, and W.Henke Influence of optical nonlinearities of photoresists on the photolithographic process: Basics 1997 Proc. SPIE 3051 Journal Article  
BibTeX
@ARTICLE{EHW97,
  author = {A. Erdmann and C.L. Henderson and C.Grant Willson and W.Henke},
  title = {Influence of optical nonlinearities of photoresists on the photolithographic
	process: Basics},
  journal = {Proc. SPIE 3051},
  year = {1997},
  volume = {3051},
  pages = {529},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., and Henke W. Simulation of optical lithography \bf Invited talk 1998 International Conference on Optics and Optoelectronics, Dehra Dun (India) Misc  
BibTeX
@CONFERENCE{ErH98,
  author = {A. Erdmann and W. Henke},
  title = {Simulation of optical lithography {\bf Invited talk}},
  booktitle = {International Conference on Optics and Optoelectronics, Dehra Dun
	(India)},
  year = {1998},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., and Henke W. Simulation of light propagation in optical linear and nonlinear layers by finite difference beam propagation and other methods 1996 Journal of Vacuum Science and Technology Journal Article  
BibTeX
@ARTICLE{ErH96,
  author = {A. Erdmann and W. Henke},
  title = {Simulation of light propagation in optical linear and nonlinear layers
	by finite difference beam propagation and other methods},
  journal = {Journal of Vacuum Science and Technology},
  year = {1996},
  volume = {14},
  pages = {3734},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Henke W., Robertson S., Richter E., and Hoppe W. and Tollkuehn B. Comparison of simulation approaches for chemically amplified resists 2001 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EHR01,
  author = {A. Erdmann and W. Henke and S. Robertson and E. Richter and B. Tollkuehn
	and W. Hoppe},
  title = {Comparison of simulation approaches for chemically amplified resists},
  journal = {Proc. SPIE},
  year = {2001},
  volume = {4404},
  pages = {99},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Erdmann A., and Kachwala N. Enhancements in rigorous simulation of light diffraction from phase shift masks 2002 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{ErK02,
  author = {A. Erdmann and N. Kachwala},
  title = {Enhancements in rigorous simulation of light diffraction from phase
	shift masks},
  journal = {Proc. SPIE},
  year = {2002},
  volume = {4691},
  pages = {1156},
  owner = {aerdmann},
  timestamp = {2008.09.12}
}
Erdmann A., and Kalus C.K. Rigorous simulation of lithographic exposure of photoresist over a nonplanar wafer 2002 19th Congress of the International Comission of Optics, Firenze (Italy) Misc  
BibTeX
@CONFERENCE{ErK02a,
  author = {A. Erdmann and C.K. Kalus},
  title = {Rigorous simulation of lithographic exposure of photoresist over
	a nonplanar wafer},
  booktitle = {19th Congress of the International Comission of Optics, Firenze (Italy)},
  year = {2002},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Kalus C.K., Schmöller T., Klyonova Y., Sato T., Endo, A., Shibata T., and Kobayashi Y. Rigorous simulation of exposure over nonplanar wafers 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EKS03a,
  author = {A. Erdmann and C.K. Kalus and T. Schmöller and Y. Klyonova and T.
	Sato and A. Endo, and T. Shibata and Y. Kobayashi},
  title = {Rigorous simulation of exposure over nonplanar wafers},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5040},
  pages = {101},
  owner = {aerdmann},
  timestamp = {2008.09.12}
}
Erdmann A., Kalus C.K., Schmöller T., Vial A., and Wolter A. Advanced simulation approaches for extreme ultraviolet lithography 2002 SEMATECH International EUV-Workshop, Dallas (USA) Misc  
BibTeX
@CONFERENCE{EKS02,
  author = {A. Erdmann and C.K. Kalus and T. Schmöller and A. Vial and A. Wolter},
  title = {Advanced simulation approaches for extreme ultraviolet lithography},
  booktitle = {SEMATECH International EUV-Workshop, Dallas (USA)},
  year = {2002},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Kalus C.K., Schmöller T., and Wolter A. Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EKS03,
  author = {A. Erdmann and C.K. Kalus and T. Schmöller and A. Wolter},
  title = {Efficient simulation of light diffraction from 3-dimensional EUV-masks
	using field decomposition techniques},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5037},
  pages = {482},
  owner = {aerdmann},
  timestamp = {2008.08.20}
}
Erdmann A., M.Arnz, Maenhoudt M., Baselmans J., and Osnabrugge van J.C. Lithographic process simulation for scanners 1998 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EAM98,
  author = {A. Erdmann and M.Arnz and M. Maenhoudt and J. Baselmans and J.C.
	van Osnabrugge},
  title = {Lithographic process simulation for scanners},
  journal = {Proc. SPIE},
  year = {1998},
  volume = {3334},
  pages = {164},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Erdmann A., Reibold D., T.Fühner, and P.Evanschitzky Photomasks for semiconductor lithography: from simple shadow casters to complex 3D scattering objects 2008 CIMTEC Misc  
BibTeX
@CONFERENCE{ERF08,
  author = {A. Erdmann and D. Reibold and T.Fühner and P.Evanschitzky},
  title = {Photomasks for semiconductor lithography: from simple shadow casters
	to complex 3D scattering objects},
  booktitle = {CIMTEC},
  year = {2008},
  owner = {aerdmann},
  timestamp = {2008.04.23}
}
Erdmann A., Schmöller T., and Evanschitzky P. Mask induced imaging artifacts in extreme ultraviolet lithography 2003 International EUV-Workshop, Antwerp Misc  
BibTeX
@CONFERENCE{ESE03,
  author = {A. Erdmann and T. Schmöller and P. Evanschitzky},
  title = {Mask induced imaging artifacts in extreme ultraviolet lithography},
  booktitle = {International EUV-Workshop, Antwerp},
  year = {2003},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Evanschitzky P., and Erdmann A. Fast near field simulation of optical and EUV masks using the waveguide method 2007 Proc. of SPIE Journal Article  
BibTeX
@ARTICLE{EvE07,
  author = {P. Evanschitzky and A. Erdmann},
  title = {Fast near field simulation of optical and EUV masks using the waveguide
	method},
  journal = {Proc. of SPIE},
  year = {2007},
  volume = {6533},
  pages = {65530Y},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Evanschitzky P., and Erdmann A. Three dimensional EUV simulations: a new mask near field and imaging simulation system 2005 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EvE05,
  author = {P. Evanschitzky and A. Erdmann},
  title = {Three dimensional EUV simulations: a new mask near field and imaging
	simulation system},
  journal = {Proc. SPIE},
  year = {2005},
  volume = {5992},
  pages = {1546},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Evanschitzky P., and Erdmann A. Enhanced model for the efficient 2D and 3D simulation of defective EUV masks 2004 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EvE04,
  author = {P. Evanschitzky and A. Erdmann},
  title = {Enhanced model for the efficient 2D and 3D simulation of defective
	EUV masks},
  journal = {Proc. SPIE},
  year = {2004},
  volume = {5374},
  pages = {770},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Evanschitzky P., and Erdmann A. The impact of EUV mask defects on lithographic process performance 2004 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EvE04a,
  author = {P. Evanschitzky and A. Erdmann},
  title = {The impact of EUV mask defects on lithographic process performance},
  journal = {Proc. SPIE},
  year = {2004},
  volume = {5504},
  pages = {111},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Evanschitzky P., Erdmann A., Besacier M., and Schiavone P. Simulation of extreme ultraviolet masks with defective multilayers 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{EEB03,
  author = {P. Evanschitzky and A. Erdmann and M. Besacier and P. Schiavone},
  title = {Simulation of extreme ultraviolet masks with defective multilayers},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5130},
  pages = {1035},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Evanschitzky P., Shao F., Erdmann A., and Reibold D. Simulation of larger mask areas using the waveguide method with fast decomposition technique 2007 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{ESE07,
  author = {P. Evanschitzky and F. Shao and A. Erdmann and D. Reibold},
  title = {Simulation of larger mask areas using the waveguide method with fast
	decomposition technique},
  journal = {Proc. SPIE},
  year = {2007},
  volume = {6730},
  pages = {67301P},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Friedrich C., Mader L., Erdmann A., List S., Kalus C. and Gordon R., Griesinger U., Pforr R., Mathuni J., Ruhl G., and Maurer W. Optimising edge topography of alternating phase shift masks using rigorous mask modelling \bf Best Poster Award 2000 SPIE Symposium on Microlithography, Santa Clara (USA) Misc  
BibTeX
@CONFERENCE{FME00,
  author = {C. Friedrich and L. Mader and A. Erdmann and S. List and R. Gordon
	and C. Kalus and U. Griesinger and R. Pforr and J. Mathuni and G.
	Ruhl and W. Maurer},
  title = {Optimising edge topography of alternating phase shift masks using
	rigorous mask modelling {\bf Best Poster Award}},
  booktitle = {SPIE Symposium on Microlithography, Santa Clara (USA)},
  year = {2000},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Fuhrmann J., Fiebach A., Uhle M., Erdmann A., and Truong C. and Szmanda C. A model of self-limiting residual acid diffusion for pattern doubling 2008 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{FFU08,
  author = {J. Fuhrmann and A. Fiebach and M. Uhle and A. Erdmann and C. Szmanda
	and C. Truong},
  title = {A model of self-limiting residual acid diffusion for pattern doubling},
  journal = {Microelectronic Engineering},
  year = {2008},
  volume = {in print},
  owner = {aerdmann},
  timestamp = {2008.09.30}
}
Fühner T., and Erdmann A. Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm 2005 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{FuE05,
  author = {T. Fühner and A. Erdmann},
  title = {Improved mask and source representations for automatic optimization
	of lithographic process conditions using a genetic algorithm},
  journal = {Proc. SPIE},
  year = {2005},
  volume = {5754},
  pages = {415},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Fühner T., Erdmann A., Farkas R., Tollkühn B., and Kokai G. Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems 2004 1st European Workshop on Hardware Optimization, Coimbra (Portugal) Misc  
BibTeX
@CONFERENCE{FEF04,
  author = {T. Fühner and A. Erdmann and R. Farkas and B. Tollkühn and G. Kokai},
  title = {Genetic algorithms to improve mask and illumination geometries in
	lithographic imaging systems},
  booktitle = {1st European Workshop on Hardware Optimization, Coimbra (Portugal)},
  year = {2004},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Fühner T., Erdmann A., and Schnattinger T. Genetic algorithms for geometry optimization in lithographic imaging systems 2004 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{FES05,
  author = {T. Fühner and A. Erdmann and T. Schnattinger},
  title = {Genetic algorithms for geometry optimization in lithographic imaging
	systems},
  journal = {Proc. SPIE},
  year = {2004},
  volume = {5558},
  pages = {29},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Fühner T., Erdmann A., and Seifert S. A direct optimization approach for lithographic process conditions 2007 Journal of Micro/Nanolithography, MEMS, and MOEMS Journal Article  
BibTeX
@ARTICLE{FuE07,
  author = {T. Fühner and A. Erdmann and S. Seifert},
  title = {A direct optimization approach for lithographic process conditions},
  journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
  year = {2007},
  volume = {6},
  pages = {031006},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Fühner Tim, Evanschitzky Peter, and Erdmann Andreas Simulation based EUV mask and source optimization 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{FEE08,
  author = {Tim Fühner and Peter Evanschitzky and Andreas Erdmann},
  title = {Simulation based EUV mask and source optimization},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {7122},
  pages = {71221Y},
  owner = {aerdmann},
  timestamp = {2008.09.30}
}
Fühner T., Kodrasi I., Kampen C., Schnattinger T., Burenkov A., and Erdmann A. A simulation study on the impact of lithographic process variations on CMOS device performance 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{FKK08,
  author = {T. Fühner and I. Kodrasi and C. Kampen and T. Schnattinger and A.
	Burenkov and A. Erdmann},
  title = {A simulation study on the impact of lithographic process variations
	on CMOS device performance},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {6924},
  pages = {692453},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Fühner T., Popp S., Dürr C., and Erdmann A. Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach 2006 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{FPD06,
  author = {T. Fühner and S. Popp and C. Dürr and A. Erdmann},
  title = {Efficient optimization of lithographic process conditions using a
	distributed, combined global/local search approach},
  journal = {Proc. SPIE},
  year = {2006},
  volume = {6154},
  pages = {1269},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Fühner T., Schnattinger T., Ardelean G., and Erdmann A. Dr.LiTHO – a development and research lithography simulator 2007 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{FSA07,
  author = {T. Fühner and T. Schnattinger and G. Ardelean and A. Erdmann},
  title = {Dr.LiTHO – a development and research lithography simulator},
  journal = {Proc. SPIE},
  year = {2007},
  volume = {6520},
  pages = {65203F-1},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Graf T., Erdmann A., Evanschitzky P., Tollkühn B., Eggers K., Ziebold R., Teuber S., and Höllein I. Aerial image analysis for defective masks in optical lithography 2005 CLEO Europe, Munich (Germany) Misc  
BibTeX
@CONFERENCE{GEE05,
  author = {T. Graf and A. Erdmann and P. Evanschitzky and B. Tollkühn and K.
	Eggers and R. Ziebold and S. Teuber and I. Höllein},
  title = {Aerial image analysis for defective masks in optical lithography},
  booktitle = {CLEO Europe, Munich (Germany)},
  year = {2005},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Henderson C.L., Scheer S.A., Tsiartas P.C., Sagan J.P. and Rathsacj B.M., Dammel R.R., Erdmann A., and Willson C.G. Modeling parameter extraction for DNQ-Novolac thick film resists 1998 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{HST98,
  author = {C.L. Henderson and S.A. Scheer and P.C. Tsiartas and B.M. Rathsacj
	and J.P. Sagan and R.R. Dammel and A. Erdmann and C.G. Willson},
  title = {Modeling parameter extraction for DNQ-Novolac thick film resists},
  journal = {Proc. SPIE},
  year = {1998},
  volume = {3333},
  pages = {256},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Holfeld C., Bubke K., Lehmann F., Fontaine La B., Pawloski R. A., Schwarzl S., Kamm F.M., Graf T., and Erdmann A. Defect printability study using EUV lithography 2006 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{HBL06,
  author = {C. Holfeld and K. Bubke and F. Lehmann and B. La Fontaine and A.
	R. Pawloski and S. Schwarzl and F.M. Kamm and T. Graf and A. Erdmann},
  title = {Defect printability study using EUV lithography},
  journal = {Proc. SPIE},
  year = {2006},
  volume = {6151},
  pages = {251},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Kalus C.K., and Erdmann A. Advances in simulation of optical lithography for topographical structures 2001 6th International Conference on Solid-State and Integrated Circuit Technology”, Shanghai (China) Misc  
BibTeX
@CONFERENCE{KaE01,
  author = {C.K. Kalus and A. Erdmann},
  title = {Advances in simulation of optical lithography for topographical structures},
  booktitle = {6th International Conference on Solid-State and Integrated Circuit
	Technology”, Shanghai (China)},
  year = {2001},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Kalus C.K., List S., Schmöller T., Erdmann A., McCallum M. and Gordon R., and Semmler A. Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications 2001 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{KLS01,
  author = {C.K. Kalus and S. List and T. Schmöller and A. Erdmann and R. Gordon
	and M. McCallum and A. Semmler},
  title = {Benchmarking of available rigorous electromagnetic field (EMF) simulators
	for phase-shift mask applications},
  journal = {Microelectronic Engineering},
  year = {2001},
  volume = {57},
  pages = {79},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Krüger D., Kalus C.K., Erdmann A., Friedrich C., and Feike A. and Käsmaier R. FIRM: a new software tool for calibration of lithography simulation 1999 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{KKE99,
  author = {D. Krüger and C.K. Kalus and A. Erdmann and C. Friedrich and R. Käsmaier
	and A. Feike},
  title = {FIRM: a new software tool for calibration of lithography simulation},
  journal = {Proc. SPIE},
  year = {1999},
  volume = {3741},
  pages = {161},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Matiut D., Erdmann A., Tollkuehn B., and Semmler A. New models for the simulation of post-exposure bake of chemically amplified resists 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{MET03,
  author = {D. Matiut and A. Erdmann and B. Tollkuehn and A. Semmler},
  title = {New models for the simulation of post-exposure bake of chemically
	amplified resists},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5039},
  pages = {1132},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Meliorisz B., and Erdmann A. Simulation of proximity printing 2007 Journal of Micro/Nanolithography, MEMS, and MOEMS Journal Article  
BibTeX
@ARTICLE{BeE2007,
  author = {B. Meliorisz and A. Erdmann},
  title = {Simulation of proximity printing},
  journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
  year = {2007},
  volume = {6},
  pages = {023006},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Meliorisz B., Erdmann A., Schnattinger T., Scheruebl T. and Stroessner U., Bisschop De P., and Philipsen V. Increasing the predictability of AIMS measurements by coupling to resist simulations 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{MES08,
  author = {B. Meliorisz and A. Erdmann and T. Schnattinger and U. Stroessner
	and T. Scheruebl and P. De Bisschop and V. Philipsen},
  title = {Increasing the predictability of AIMS measurements by coupling to
	resist simulations},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {7028},
  pages = {70282S},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Meliorisz B., Evanschitzky P., and Erdmann A. Simulation of proximity and contact lithography 2007 Microlectronic Engineering Journal Article  
BibTeX
@ARTICLE{MEE07,
  author = {B. Meliorisz and P. Evanschitzky and A. Erdmann},
  title = {Simulation of proximity and contact lithography},
  journal = {Microlectronic Engineering},
  year = {2007},
  volume = {84},
  pages = {733},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Nikolaev N., and Erdmann A. Rigorous simulation of alignment for microlithography 2003 Journal of Microlithography, Microfabrication and Microsystems Journal Article  
BibTeX
@ARTICLE{NiE03,
  author = {N. Nikolaev and A. Erdmann},
  title = {Rigorous simulation of alignment for microlithography},
  journal = {Journal of Microlithography, Microfabrication and Microsystems},
  year = {2003},
  volume = {2},
  pages = {220},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Nikolaev N.I., and Erdmann A. Simulation of alignment for microlithography 2002 Workshop of Marie-Curie Fellows on research and training in physics and technology, Geneva (Switzerland) Misc  
BibTeX
@CONFERENCE{NiE02,
  author = {N.I. Nikolaev and A. Erdmann},
  title = {Simulation of alignment for microlithography},
  booktitle = {Workshop of Marie-Curie Fellows on research and training in physics
	and technology, Geneva (Switzerland)},
  year = {2002},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Nikolaev N.I., and Erdmann A. Simulation of alignment for microlithography 2002 Marie Curie Fellowships European Scientific Workshop "Developing a Scientific Career" San Sebastian (Spain) Misc  
BibTeX
@CONFERENCE{NiE02a,
  author = {N.I. Nikolaev and A. Erdmann},
  title = {Simulation of alignment for microlithography},
  booktitle = {Marie Curie Fellowships European Scientific Workshop "Developing
	a Scientific Career" San Sebastian (Spain)},
  year = {2002},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Nikolaev N.I., and Erdmann A. Simulation of alignment for microlithography 2001 11th Workshop of Marie-Curie Fellows Paul-Drude-Institute for Solid State Electronics, Berlin (Germany) Misc  
BibTeX
@CONFERENCE{NiE01,
  author = {N.I. Nikolaev and A. Erdmann},
  title = {Simulation of alignment for microlithography},
  booktitle = {11th Workshop of Marie-Curie Fellows Paul-Drude-Institute for Solid
	State Electronics, Berlin (Germany)},
  year = {2001},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Patsis G.P., Drygiannakis D., Raptis I., and Erdmann A. and Gogolides E. Advanced lithography models for strict process control in the 32nm technology node 2008 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{PDR08,
  author = {G.P. Patsis and D. Drygiannakis and I. Raptis and E. Gogolides and
	A. Erdmann},
  title = {Advanced lithography models for strict process control in the 32nm
	technology node},
  journal = {Microelectronic Engineering},
  year = {2008},
  volume = {in print},
  owner = {aerdmann},
  timestamp = {2008.09.30}
}
Philipsen V., Mesuda K., Bisschop De P., Citarella G. and Erdmann A., Evanschitzky P., Birkner R., and Scherübl T. Richterand R. Impact of alternative mask stacks on the imaging performance at NA 1.20 and above 2007 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{PMB07,
  author = {V. Philipsen and K. Mesuda and P. De Bisschop and A. Erdmann and
	G. Citarella and P. Evanschitzky and R. Birkner and R. Richterand
	T. Scherübl},
  title = {Impact of alternative mask stacks on the imaging performance at NA
	1.20 and above},
  journal = {Proc. SPIE},
  year = {2007},
  volume = {6730},
  pages = {67301N},
  owner = {aerdmann},
  timestamp = {2008.04.03}
}
Reibold D., Shao F., Erdmann A., and Peschel U. Extraordinary low transmission effects for ultra-thin patterned metal films 2009 Optics Express Journal Article  
BibTeX
@ARTICLE{RSE09,
  author = {D. Reibold and F. Shao and A. Erdmann and U. Peschel},
  title = {Extraordinary low transmission effects for ultra-thin patterned metal
	films},
  journal = {Optics Express},
  year = {2009},
  volume = {17},
  pages = {544-551},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Rosenbusch A., Erdmann A., and Friedrich C. Optical simulation of 3D mask defects 2000 Semiconductor FABTECH Journal Article  
BibTeX
@ARTICLE{REF00,
  author = {A. Rosenbusch and A. Erdmann and C. Friedrich},
  title = {Optical simulation of 3D mask defects},
  journal = {Semiconductor FABTECH},
  year = {2000},
  volume = {12},
  pages = {187},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Sambale C., Schmöller T., Erdmann A., and Kalus C. and Evanschitzky P. Rigorous simulation of defective EUV multilayer masks 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{SSE03,
  author = {C. Sambale and T. Schmöller and A. Erdmann and P. Evanschitzky and
	C. Kalus},
  title = {Rigorous simulation of defective EUV multilayer masks},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5256},
  pages = {1239},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Schnattinger T., Bär E., and Erdmann A. Mesoscopic resist processing simulation in optical lithography 2006 Simulation of Semiconductor Processes and Devices (SISPAD), Monterey (USA) Misc  
BibTeX
@CONFERENCE{SBE06,
  author = {T. Schnattinger and E. Bär and A. Erdmann},
  title = {Mesoscopic resist processing simulation in optical lithography},
  booktitle = {Simulation of Semiconductor Processes and Devices (SISPAD), Monterey
	(USA)},
  year = {2006},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Schnattinger T., Bär E., and Erdmann A. A fast development simulation algorithm for discrete resist models 2006 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{SBE06a,
  author = {T. Schnattinger and E. Bär and A. Erdmann},
  title = {A fast development simulation algorithm for discrete resist models},
  journal = {Microelectronic Engineering},
  year = {2006},
  volume = {83},
  pages = {1008},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Schnattinger T., Bär E., and Erdmann A. Three-dimensional resist development simulation with discrete models 2006 J. Vac. Sci. Technol. B Journal Article  
BibTeX
@ARTICLE{SBE06b,
  author = {T. Schnattinger and E. Bär and A. Erdmann},
  title = {Three-dimensional resist development simulation with discrete models},
  journal = {J. Vac. Sci. Technol. B},
  year = {2006},
  volume = {24},
  pages = {3040},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Schnattinger T., and Erdmann A. A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{ScE08,
  author = {T. Schnattinger and A. Erdmann},
  title = {A comprehensive resist model for the prediction of line-edge roughness
	material and process dependencies in optical lithography},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {6923},
  pages = {69230R},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Schnattinger T., and Erdmann A. Lithographic importance of base diffusion in chemically amplified photoresists 2008 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{ScE08a,
  author = {T. Schnattinger and A. Erdmann},
  title = {Lithographic importance of base diffusion in chemically amplified
	photoresists},
  journal = {Microelectronic Engineering},
  year = {2008},
  volume = {in print},
  owner = {aerdmann},
  timestamp = {2008.09.30}
}
Seidl A., Schnattinger T., Erdmann A., Hartmann H., and Petrashenko A. Accurate extraction of maximum current densities from the layout 2006 J. Computational Electronics Journal Article  
BibTeX
@ARTICLE{SSE06,
  author = {A. Seidl and T. Schnattinger and A. Erdmann and H. Hartmann and A.
	Petrashenko},
  title = {Accurate extraction of maximum current densities from the layout},
  journal = {J. Computational Electronics},
  year = {2006},
  volume = {5},
  pages = {381},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Shao F., Evanschitzky Peter, Fühner T., and Erdmann A. Rigorous diffraction simulations of topographic wafer stacks in double patterning 2008 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{SEF08,
  author = {F. Shao and Peter Evanschitzky and T. Fühner and A. Erdmann},
  title = {Rigorous diffraction simulations of topographic wafer stacks in double
	patterning},
  journal = {Microelectronic Engineering},
  year = {2008},
  volume = {in print},
  owner = {aerdmann},
  timestamp = {2008.09.30}
}
Shao F., Evanschitzky P., Reibold D., and Erdmann A. Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique 2008 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{SER08,
  author = {F. Shao and P. Evanschitzky and D. Reibold and A. Erdmann},
  title = {Fast rigorous simulation of mask diffraction using the waveguide
	method with parallelized decomposition technique},
  journal = {Proc. SPIE},
  year = {2008},
  volume = {6792},
  pages = {679206},
  owner = {aerdmann},
  timestamp = {2008.07.13}
}
Tollkühn B., Erdmann A., Kivel N., Robertson S., Hansen S. and Kang D., Chiou T.B., Fumar-Pici A., and Hoppe W. New methods to calibrate simulation parameters for chemically amplified resists 2002 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{TEK02,
  author = {B. Tollkühn and A. Erdmann and N. Kivel and S. Robertson and D. Kang
	and S. Hansen and T.B. Chiou and A. Fumar-Pici and W. Hoppe},
  title = {New methods to calibrate simulation parameters for chemically amplified
	resists},
  journal = {Proc. SPIE},
  year = {2002},
  volume = {4691},
  pages = {1168},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Tollkühn B., Erdmann A., Lammers J., Nölscher C., and Semmler A. Do we need complex resist models for predictive simulation of lithographic process pperformance? 2004 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{TEL04,
  author = {B. Tollkühn and A. Erdmann and J. Lammers and C. Nölscher and A.
	Semmler},
  title = {Do we need complex resist models for predictive simulation of lithographic
	process pperformance?},
  journal = {Proc. SPIE},
  year = {2004},
  volume = {5376},
  pages = {983},
  owner = {aerdmann},
  timestamp = {2008.07.29}
}
Tollkühn B., Erdmann A., Semmler A., and Nölscher C. Simplified resist models for efficient simulation of contact holes and line ends 2005 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{TES05,
  author = {B. Tollkühn and A. Erdmann and A. Semmler and C. Nölscher},
  title = {Simplified resist models for efficient simulation of contact holes
	and line ends},
  journal = {Microelectronic Engineering},
  year = {2005},
  volume = {78-79},
  pages = {509},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Tollkühn B., Fühner T., Matiut D., Erdmann A., Küchler B. and Semmler A., and Kokai G. Will Darwins law help us to improve our resist models 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{TFM03,
  author = {B. Tollkühn and T. Fühner and D. Matiut and A. Erdmann and A. Semmler
	and B. Küchler and G. Kokai},
  title = {Will Darwins law help us to improve our resist models},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5039},
  pages = {291},
  owner = {aerdmann},
  timestamp = {2008.07.29}
}
Tollkühn B., Heubner A., Elian K., Ruppenstein B., and Erdmann A. Correlation analysis: a fast and reliable method for a better understanding of simulation models in optical lithography 2005 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{THE05,
  author = {B. Tollkühn and A. Heubner and K. Elian and B. Ruppenstein and A.
	Erdmann},
  title = {Correlation analysis: a fast and reliable method for a better understanding
	of simulation models in optical lithography},
  journal = {Proc. SPIE},
  year = {2005},
  volume = {5755},
  pages = {37},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Tollkühn B., Hoepfl M., Erdmann A., Majoni S., and Jess M. Automatic resist parameter calibration procedure for lithography simulation 2001 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{THE01,
  author = {B. Tollkühn and M. Hoepfl and A. Erdmann and S. Majoni and M. Jess},
  title = {Automatic resist parameter calibration procedure for lithography
	simulation},
  journal = {Proc. SPIE},
  year = {2001},
  volume = {4404},
  pages = {313},
  owner = {aerdmann},
  timestamp = {2008.07.29}
}
Vial A., Erdmann A., Schmöller T., and Kalus C.K. Modification of boundaries conditions in the FDTD algorithm for EUV masks modelling 2002 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{VES02,
  author = {A. Vial and A. Erdmann and T. Schmöller and C.K. Kalus},
  title = {Modification of boundaries conditions in the FDTD algorithm for EUV
	masks modelling},
  journal = {Proc. SPIE},
  year = {2002},
  volume = {890},
  pages = {4754},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Windpassinger R., Rosenkranz N., Scherubl T., Erdmann A. and Evanschitzky P., and Zibold A. EUV mask simulation for AIMS 2003 Proc. SPIE Journal Article  
BibTeX
@ARTICLE{WRS03,
  author = {R. Windpassinger and N. Rosenkranz and T. Scherubl and P. Evanschitzky
	and A. Erdmann and A. Zibold},
  title = {EUV mask simulation for AIMS},
  journal = {Proc. SPIE},
  year = {2003},
  volume = {5256},
  pages = {2003},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Zanke Ch., Gombert A., Erdmann A., and Weiss M. Simulation and optimization of holographically exposed photoresist gratings 1998 International Conference on Optics and Optoelectronics, Dehra Dun (India) Misc  
BibTeX
@CONFERENCE{ZGE98,
  author = {Ch. Zanke and A. Gombert and A. Erdmann and M. Weiss},
  title = {Simulation and optimization of holographically exposed photoresist
	gratings},
  booktitle = {International Conference on Optics and Optoelectronics, Dehra Dun
	(India)},
  year = {1998},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Zanke Ch., Gombert A., Erdmann A., and Weiss M. Fine tuned profile simulation of holographically exposed photoresist gratings 1998 Optics Communications Journal Article  
BibTeX
@ARTICLE{ZGE98a,
  author = {Ch. Zanke and A. Gombert and A. Erdmann and M. Weiss},
  title = {Fine tuned profile simulation of holographically exposed photoresist
	gratings},
  journal = {Optics Communications},
  year = {1998},
  volume = {154},
  pages = {109},
  owner = {aerdmann},
  timestamp = {2008.12.23}
}
Schnattinger T., and Bär E. Comparison of Different Approaches for the Simulation of Topography Evolution during Lithography Development 2005 Simulation of Semiconductor Processes and Devices 2005 Conference Article  
BibTeX
@INPROCEEDINGS{schnattinger05,
  AUTHOR =       {T. Schnattinger and E. B\"ar},
  TITLE =        {Comparison of Different Approaches for the Simulation of Topography Evolution during Lithography Development},
  BOOKTITLE =    {Simulation of Semiconductor Processes and Devices 2005},
  YEAR =         {2005},
  pages =        {215-218},
  month =        {September},
}
Schnattinger T., Bär E., and Erdmann A. Mesoscopic resist processing simulation in optical lithography 2006 Simulation of Semiconductor Processes and Devices 2006 Conference Article  
BibTeX
@INPROCEEDINGS{schnattinger06c,
  AUTHOR =       {T. Schnattinger and E. B\"ar and A. Erdmann},
  TITLE =        {Mesoscopic resist processing simulation in optical lithography},
  BOOKTITLE =    {Simulation of Semiconductor Processes and Devices 2006},
  YEAR =         {2006},
  pages =        {341-344},
  month =        {September},
}
Schnattinger T., Bär E., and Erdmann A. A fast development simulation algorithm for discrete resist models 2006 Microelectronic Engineering Journal Article  
BibTeX
@ARTICLE{schnattinger06,
  AUTHOR =       {T. Schnattinger and E. B\"ar and A. Erdmann},
  TITLE =        {A fast development simulation algorithm for discrete resist models},
  JOURNAL =      {Microelectronic Engineering},
  YEAR =         {2006},
  volume =       {83},
  pages =        {1008-1011},
}
Schnattinger T., Bär E., and Erdmann A. Three-dimensional resist development simulation with discrete models 2006 J. Vac. Sci. Technol. B Journal Article  
BibTeX
@ARTICLE{schnattinger06b,
  AUTHOR =       {T. Schnattinger and E. B\"ar and A. Erdmann},
  TITLE =        {Three-dimensional resist development simulation with discrete models},
  JOURNAL =      {J.\ Vac.\ Sci.\ Technol.\ B},
  YEAR =         {2006},
  volume =       {24},
  number =       {6},
  pages =        {3040-3043},
  month =        {November},
}
Seidl A., Schnattinger T., Erdmann A., Hartmann H., and Petrashenko A. Accurate extraction of maximum current densities from the layout 2006 J. Computational Electronics Journal Article  
BibTeX
@ARTICLE{schnattinger06d,
  AUTHOR =       {A. Seidl and T. Schnattinger and A. Erdmann and H. Hartmann and A. Petrashenko},
  TITLE =        {Accurate extraction of maximum current densities from the layout},
  JOURNAL =      {J.\ Computational Electronics},
  YEAR =         {2006},
  volume =       {5},
  pages =        {381-384},
}
Erdmann A., Farkas R., Fühner T., and Kókai G. and Tollkühn B. Mask and Source Optimization for Lithographic Imaging Systems 2003 Proc. SPIE Conference Article  
BibTeX
@INPROCEEDINGS{erdmann.farkas:p.2003,
  author = {A. Erdmann and R. Farkas and T. F\"{u}hner and B. Tollk\"{u}hn and
	G. K\'{o}kai},
  title = {{Mask and Source Optimization for Lithographic Imaging Systems}},
  booktitle = {Proc. {SPIE}},
  year = {2003},
  volume = {5182},
  note = {in print}
}
Fühner Tim, and Erdmann Andreas Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm 2005 Proc. SPIE Conference Article  
BibTeX
@INPROCEEDINGS{fuehner.erdmann:p.2005,
  author = {{Tim F\"uhner} and {Andreas Erdmann}},
  title = {Improved mask and source representations for automatic optimization
	of lithographic process conditions using a genetic algorithm},
  booktitle = {Proc. {SPIE}},
  year = {2005},
  volume = {5754},
  pages = {415-426},
  abstract = {Intuitive design of the lithographic process becomes increasingly
	complicated in the regime of off-axis illumination and optical proximity
	correction. Therefore, new optimization procedures have to be introduced
	to facilitate the search for ideal process settings. This paper proposes
	mutual optimization of illumination and mask geometries using an
	automatic optimization approach based on a genetic algorithm. As
	presented elsewhere, this optimization procedure has been applied
	to different mask representations. It has been found that a blend
	of a fully parameterized and a pixel-based representation, i.e.,
	a rectangle representation, leads to highly innovative solutions,
	but can still maintain an acceptable convergence behavior. This representation
	is revisited and its main principles and limitations are shortly
	discussed. The main focus of this paper is on a refinement of the
	source geometry representation. In previous versions, the general
	illumination setup had to be prespecified. Merely its parameters
	(e.g, inner and outer radius of annular illumination, number, offset,
	and radius of poles for multipole illumination) were optimized. In
	this work, the source is represented by a sector/track definition,
	which allows different sections of the illumination to have different
	transmission values. The obtained illumination geometry is transferred
	into a pixel-based representation, processable by the utilized Fraunhofer
	IISB in-house lithography simulator. The illumination shapes achieved
	with the proposed approach can, for example, be produced by diffractive
	optics elements (DOEs). Various merit criteria determine the imaging
	performance of both the mask and the source settings. As the merit
	or fitness function plays one of the central roles in the proposed
	optimization scheme, individual fitness criteria and their transformation
	into an objective function are revisited and shortly explained. New
	results for both dense and chain contact hole layouts, and a comparison
	with former results validate the proposed approach and illustrate
	its further potentials.}
}
Abstract Intuitive design of the lithographic process becomes increasingly complicated in the regime of off-axis illumination and optical proximity correction. Therefore, new optimization procedures have to be introduced to facilitate the search for ideal process settings. This paper proposes mutual optimization of illumination and mask geometries using an automatic optimization approach based on a genetic algorithm. As presented elsewhere, this optimization procedure has been applied to different mask representations. It has been found that a blend of a fully parameterized and a pixel-based representation, i.e., a rectangle representation, leads to highly innovative solutions, but can still maintain an acceptable convergence behavior. This representation is revisited and its main principles and limitations are shortly discussed. The main focus of this paper is on a refinement of the source geometry representation. In previous versions, the general illumination setup had to be prespecified. Merely its parameters (e.g, inner and outer radius of annular illumination, number, offset, and radius of poles for multipole illumination) were optimized. In this work, the source is represented by a sector/track definition, which allows different sections of the illumination to have different transmission values. The obtained illumination geometry is transferred into a pixel-based representation, processable by the utilized Fraunhofer IISB in-house lithography simulator. The illumination shapes achieved with the proposed approach can, for example, be produced by diffractive optics elements (DOEs). Various merit criteria determine the imaging performance of both the mask and the source settings. As the merit or fitness function plays one of the central roles in the proposed optimization scheme, individual fitness criteria and their transformation into an objective function are revisited and shortly explained. New results for both dense and chain contact hole layouts, and a comparison with former results validate the proposed approach and illustrate its further potentials.
Fühner Tim, Erdmann Andreas, Farkas Richard, Tollkühn Bernd, and Kókai Gabriella Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems 2004 EvoWorkshops 2004 Conference Article  
BibTeX
@INPROCEEDINGS{fuehner.erdmann:p.2004,
  author = {{Tim F\"uhner} and {Andreas Erdmann} and {Richard Farkas} and {Bernd
	Tollk\"uhn} and {Gabriella K\'okai}},
  title = {Genetic Algorithms to Improve Mask and Illumination Geometries in
	Lithographic Imaging Systems},
  booktitle = {EvoWorkshops 2004},
  year = {2004},
  editor = {Raidl et al.},
  pages = {208--217},
  abstract = {This paper proposes the use of a genetic algorithm to optimize mask
	and illumination geometries in optical projection lithography. A
	fitness function is introduced that evaluates the imaging quality
	of arbitrary line patterns in a specified focus range. As a second
	criterion the manufacturability and inspectability of the mask are
	taken into account. With this approach optimum imaging conditions
	can be identified without any additional a-priori knowledge of the
	lithographic process. Several examples demonstrate the successful
	application and further potentials of the proposed concept.},
  pdf = {/home/data2/fuehner/docs/litho/2004/evohot04/evohot04.pdf},
}
Abstract This paper proposes the use of a genetic algorithm to optimize mask and illumination geometries in optical projection lithography. A fitness function is introduced that evaluates the imaging quality of arbitrary line patterns in a specified focus range. As a second criterion the manufacturability and inspectability of the mask are taken into account. With this approach optimum imaging conditions can be identified without any additional a-priori knowledge of the lithographic process. Several examples demonstrate the successful application and further potentials of the proposed concept.
Fühner Tim, Erdmann Andreas, and Schnattinger Thomas Genetic algorithms for geometry optimization in lithographic imaging systems 2004 Proc. SPIE Conference Article  
BibTeX
@INPROCEEDINGS{fuehner.erdmann:p.2004b,
  author = {{Tim F\"uhner} and {Andreas Erdmann} and {Thomas Schnattinger}},
  title = {Genetic algorithms for geometry optimization in lithographic imaging
	systems},
  booktitle = {Proc. {SPIE}},
  year = {2004},
  volume = {5558},
  pages = {29-40},
  abstract = {This paper illustrates the use of genetic algorithms (GA) in optimizing
	mask and illumination source geometries for lithographic imaging
	systems. The main goal of the proposed optimization process is to
	find optimum conditions for the generation of certain features like
	lines and spaces patterns or arrays of contact holes by optical projection
	lithography. Therefore, different optical resolution enhancement
	techniques, such as optical proximity correction (OPC) by sub-resolution
	assists, phase shift masks, and off-axis illumination techniques
	are combined and mutually optimized. This paper focuses on improving
	both the genetic algorithm's settings and the representation of the
	mask and source geometries. It is shown that these two issues have
	a significant impact on the convergence behavior of the GA. Different
	representation types for the mask and source geometry are introduced,
	and their advantages and problems are discussed. One of the most
	critical tasks in formulating the optimization problem is to set
	up an appropriate fitness function. In our case, the fitness function
	consists of five sub-functions, which ensure valid geometries, correct
	feature dimensions, a stable process for different defocus settings,
	the mask's manufacturability and inspectability, and that no other
	features besides the specified target are printed. In order to obtain
	a stable and fast convergence these criteria have to be assessed.
	Different weight settings are introduced and their impact on the
	convergence behavior is discussed. Several results show the potential
	of the proposed approach and directions for further improvements.
	}
}
Abstract This paper illustrates the use of genetic algorithms (GA) in optimizing mask and illumination source geometries for lithographic imaging systems. The main goal of the proposed optimization process is to find optimum conditions for the generation of certain features like lines and spaces patterns or arrays of contact holes by optical projection lithography. Therefore, different optical resolution enhancement techniques, such as optical proximity correction (OPC) by sub-resolution assists, phase shift masks, and off-axis illumination techniques are combined and mutually optimized. This paper focuses on improving both the genetic algorithm's settings and the representation of the mask and source geometries. It is shown that these two issues have a significant impact on the convergence behavior of the GA. Different representation types for the mask and source geometry are introduced, and their advantages and problems are discussed. One of the most critical tasks in formulating the optimization problem is to set up an appropriate fitness function. In our case, the fitness function consists of five sub-functions, which ensure valid geometries, correct feature dimensions, a stable process for different defocus settings, the mask's manufacturability and inspectability, and that no other features besides the specified target are printed. In order to obtain a stable and fast convergence these criteria have to be assessed. Different weight settings are introduced and their impact on the convergence behavior is discussed. Several results show the potential of the proposed approach and directions for further improvements.
Fühner Tim, and Jung Thomas Use of genetic algorithms for the development and optimization of crystal growth processes 2004 Journal of Crystal Growth Journal Article  
BibTeX
@ARTICLE{fuehner.jung:2004,
  author = {{Tim F\"uhner} and {Thomas Jung}},
  title = {Use of genetic algorithms for the development and optimization of
	crystal growth processes},
  journal = {Journal of Crystal Growth},
  year = {2004},
  volume = {special issue: Modeling in Crystal Growth},
  note = {in print}
}
Tollkühn B., Fühner T., Matiut D., Kókai G. and Erdmann A., and Semmler A. Will Darwin's Law Help Us to Improve Our Resist Models 2003 Proc. SPIE Conference Article  
BibTeX
@INPROCEEDINGS{tollkuehn.fuehner:p.2003,
  author = {B. Tollk\"{u}hn and T. F\"{u}hner and D. Matiut and A. Erdmann and
	G. K\'{o}kai and A. Semmler},
  title = {{Will Darwin's Law Help Us to Improve Our Resist Models}},
  booktitle = {Proc. {SPIE}},
  year = {2003},
  volume = {5039},
  pages = {291 -- 302}
}